Atmospheric humidity strongly influences the interactions
between
dry granular particles in process containers. To reduce the energy
loss in industrial production processes caused by particle agglomeration,
a basic understanding of the dependence of particle interactions on
humidity is necessary. Hence, in this study, molecular dynamic simulations
were carried out to calculate the adhesion between silica surfaces
in the presence of adsorbed water. For a realistic description, the
choice of force field is crucial. Because of their frequent use and
transferability to biochemical systems, the Clay and CWCA force fields
were investigated with respect to their ability to describe the water–silica
interface in comparison to the more advanced Reax force field, ab
initio calculations, and experiments.
Adhesion forces between nanoparticles
strongly depend on the amount
of adsorbed condensed water from ambient atmosphere. Liquid water
forms bridges in the cavities separating the particles, giving rise
to the so-called capillary forces which in most cases dominate the
van der Waals and long-range electrostatic interactions. Capillary
forces promote the undesirable agglomeration of particles to large
clusters, thereby hindering the flowability of dry powders in process
containers. In process engineering macroscopic theories based on the
Laplace pressures are used to estimate the strength of the capillary
forces. However, especially for low relative humidity and when the
wetting of rough or small nanoparticles is studied, those theories
can fail. Molecular dynamic simulations can help to give better insight
into the water–particle interface. The simulated force versus
distance curve as well as adhesion forces and the adsorption isotherm
for silica nanoparticles at varying relative humidity will be discussed
in comparison to experiments, theories, and simulations.
We present an implementation of a (mesh-free) smooth particle hydrodynamics (SPH) algorithm, intended for the application to solid bodies, and use it to simulate scratch-induced surface damage on an elasto-viscoplastic material. If conventional SPH is used to simulate solids, an unphysically high artificial viscosity is required to damp strong oscillatory modes and thus stabilize the system. To overcome these intrinsic difficulties associated with modeling solid bodies, the recently implemented so-called total-Lagrangian SPH utilizes an hourglass control scheme similar to what is known from finite element algorithms. Elasto-viscoplastic material properties are modeled by using the Mie–Grüneisen equation of state and the Johnson–Cook model. The material parameters are selected to reproduce the strain-stress behavior of annealed oxygen-free high conductivity copper. The spherical indenter is modeled as a rigid sphere. The topographies of the calculated scratch-induced surface damage are in excellent agreement with experimental scratch tests carried out at comparable normal loads. We also calculate the real contact area between the indenter and the surface, allowing a sound estimation of the scratch hardness
We present a method for calculating the thermodynamic and structural properties of a polydisperse liquid by means of a thermodynamic perturbation theory: the optimized random phase approximation (ORPA). The approach is an extension of a method proposed recently by one of us for an integral equation application [Phys. Rev. E 54, 4411 (1996)]. The method is based on expansions of all sigma-dependent functions in the orthogonal polynomials p(i)(sigma) associated with the weight function f(Sigma)(sigma), where sigma is a random variable (in our case the size of the particles) with distribution f(Sigma)(sigma). As in the one-component or general N-component case, one can show that the solution of the ORPA is equivalent to the minimization of a suitably chosen functional with respect to variations of the direct correlation functions. To illustrate the method, we study a polydisperse system of square-well particles; extension to other hard-core or soft-core systems is straightforward.
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