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Several diamond coatings were performed on -TiAl substrates by a microwave-plasma assisted CVD, which were made directly to the substrate and indirectly to the TiC, Ti5Si3, Al2O3+TiO2 and Si layers on the substrate. The direct coatings suffered from severe delamination and cracks. The deposited layers on TiC and Ti5Si3 layers partially delaminated, while those on Al2O3+TiO2 and Si layers adhered well without delamination. All the diamond films deposited were characterized using scanning electron microscopy, Raman spectroscopy, and X-ray diffraction. Raman spectra showed that poly- and nano-crystalline diamond films were obtained for the coatings of -TiAl.

The NbSi2/Nb/-TiAl and NbSi2/Nb functionally graded materials (FGMs) were prepared and their tolerances tested by exposing them to temperatures from 1050 °C to 1250 °C under vacuum and in air. Oxygen resistivity was estimated from metallographic investigations. The FGM lifetime was estimated by using a diffusion equation that considers the disappearance of the NbSi2 and Nb interlayer. These occurred during NbSi2 oxidation and Si diffusion from NbSi2 to Nb and interdiffusion between Nb and -TiAl. The results were validated by diffusion equations.