This paper describes the interaction between operating parameters of target wafer surface. We use an organometallic (C) precursor gas in the focused ion beam deposition process. Under the beam intensity conditions (30kV), the influences of the on-target beam control parameters, such as dwell time, beam spacing, minimum frame time and scan type, were investigated by the deposition tests. The analysis was carried out with the variation of dimensions and shapes of the single pattern. The operating parameters considered in this research are implemented in the next double-patterning deposition. The test presented how their interaction appeared on the processing results. The analysis configured out the FIB induced deposition of single pattern with the variation of operating parameters. Additionally the result shows that the sequent beam job influenced the double-patterning deposition significantly. On-beam target conditions should be optimized for the target complicated shapes and high aspect-ratios.
3-D radiographic methodology has been into the spotlight for quality inspection of mass product or in-service inspection of aging product. To locate a target object in 3-D space, its characteristic contours such as edge length, edge angle, and vertices are very important. In spite of a simple geometry product, it is very difficult to get clear shape contours from a single radiographic image. The image contains scattering noise at the edges and ambiguity coming from X-Ray absorption within the body. This article suggests a concise method to extract whole edges from a single X-ray image. At the edge point of the object, the intensity of the X-ray decays exponentially as the X-ray penetrates the object. Considering this X-Ray decaying property, edges are extracted by using the least square fitting with the control of Coefficient of Determination.
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