Diamond & Carey (1986) have argued that expertise in face recognition depends on the ability to code configural properties in addition to isolated features. We tested this hypothesis in two experiments by comparing the effect of inversion on recognition of 'own race' (high expertise) and 'other race' (low expertise) faces. Use of configural information should be associated with a larger inversion effect than use of isolated features, and therefore inversion should produce a larger recognition decrement for own race than for other race faces. In Expt 1 there was a larger inversion effect in reaction times for recognition of own race faces than other race faces, for both European and Chinese subjects (ceiling effects made interpretation of accuracy difficult). In Expt 2 a larger own race inversion effect was found for recognition accuracy, when test face pairs were randomly selected, but not when they were matched on isolated features. Our results are largely consistent with the hypothesis that expertise is associated with greater use of configural information in faces.

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Purpose The purpose of this paper is to develop bansho analysis as a research method to improve observation and analysis of instruction in lesson study, which could potentially visualise pupils’ thinking processes in a lesson. Design/methodology/approach The paper opted for a qualitative method of case study analysis. Data are drawn from a Year 6 Japanese Language lesson of a Japanese primary school. Data collection and data analysis are informed by transcript-based lesson analysis. The process of bansho formation is also reproduced based on video and audio data. Findings Bansho analysis illustrates three main patterns of pupils’ thinking processes, namely, variation of ideas, connection of ideas and attention to ideas. Pupils’ opinion sharing at the beginning of the lesson led to a variety of ideas and they were recorded as part of bansho. There, pupils proceeded to establish connection among ideas. Finally, pupils displayed attention to ideas which were recorded on bansho, by returning to ideas that intrigued them. Research limitations/implications There is a need to investigate the teacher’s role in bansho formation processes in order to develop a more comprehensive bansho analysis method. Other teaching and learning materials such as lesson plans and pupils’ notes should also be included in the study of bansho to develop a more comprehensive bansho analysis. Originality/value Bansho analysis proposed in this paper allows educators and researchers to study bansho with visualisation of bansho-related data. It would serve as an invaluable source of evidence during the observation and reflection stage of lesson study cycle.

Analyses of cytokinins are very important in both plant physiological and biomedical research as they are implicated in many biological processes. Reliable, sensitive, selective and inexpensive methods that are flexible and designed for automation are required for these analyses. This review addresses the advances made in the separation and determination of cytokinins by CE as well as the other applications of CE (i.e., determination of dissociation constants and complexation constants of cytokinins). The various CE modes used to separate the compounds and the quantification strategies are examined. Special attention is also focused on those aspects that improve on the sensitivity and/or selectivity, such as sample extraction and preconcentration, on-line preconcentration techniques (stacking), and/or specific detectors (e.g., MS). With the coupling to the preconcentration techniques and certain detection systems, numerous CE methods can potentially be adapted for the analysis of cytokinins in complex biological samples. Therefore, we would anticipate wider applications of CE methods in the near future for cytokinin analyses, which should facilitate a decrease in analysis cost and should help to improve analysis efficiency.

During the fabrication of a MOS-HEMT, the plasma-etching steps are critical because they can damage the GaN materials and lead to electrical degradation effects. In this paper, we propose to evaluate GaN etching performances through comparing the Cl2-based atomic layer etching (ALE) process with He or Ar as the sputtering gas. The self-limiting synergy and process window of ALE has been investigated. Based on these results, we propose the reasons for the nonself-limiting behavior of the He ALE process. Both ALE processes were compared to a steady-state process by investigating roughness, and electrical measurements, in order to evaluate the induced damage.