Resistive random access memory (RRAM) based on ultrathin 2D materials is considered to be a very feasible solution for future data storage and neuromorphic computing technologies. However, controllability and stability are the problems that need to be solved for practical applications. Here, by introducing a damage-less ion implantation technology using ultralow-energy plasma, the transport mechanisms of space charge limited current and Schottky emission are successfully realized and controlled in RRAM based on 2D Bi 2 Se 3 nanosheets. The memristors exhibit stable resistive switching behavior with a high resistive switching ratio (>10 4 ), excellent cycling endurances (300 cycles), and great retention performance (>10 4 s). The reliability and controllability of Bi 2 Se 3 memory endowed by oxygen plasma injection demonstrate the great potential of this ultralow-energy ion implantation technology in the application of 2D RRAM.

Nickel-rich cathode materials are increasingly being applied in commercial lithium-ion batteries to realize higher specific capacity as well as improve energy density. However, low structural stability and rapid capacity decay at high voltage and temperature hinder their rapid large-scale application. Herein, a wet chemical method followed by a post-annealing process is utilized to realize the surface coating of tantalum oxide on LiNi0.88Mn0.03Co0.09O2, and the electrochemical performance is improved. The modified LiNi0.88Mn0.03Co0.09O2 displays an initial discharge capacity of ~233 mAh/g at 0.1 C and 174 mAh/g at 1 C after 150 cycles in the voltage range of 3.0-4.4 V at 45 ℃, and it also exhibits an enhanced rate capability with 118 mAh/g at 5 C. The excellent performance is due to the introduction of tantalum oxide as a stable and functional layer to protect the surface of LiNi0.88Mn0.03Co0.09O2, and the surface side reactions and cation mixing are suppressed at the same time without hampering the charge transfer kinetics.

Recent progress in the fabrication of controlled structures and advanced materials has improved battery performance in terms of specific capacity, rate capability, and cycling stability. However, interfacial problems such as increased resistance and contact instability between the electrodes and solid/liquid electrolytes still put pressure on the controllable formation of structures and the improvement of performance as well as safety. Here, we first briefly introduce the deposition techniques in terms of working mechanism and experimental process, then illustrate the associated advantages/disadvantages of the surface engineering methods based on deposition techniques (physical vapor deposition and chemical reaction deposition) to the provision of reference for researchers selecting the appropriate approach. Second, we exemplify the Si/LiCoO2/LiPON/Li to demonstrate the main progress made in lithium-ion batteries, elaborating on the efforts in engineering the reactive surface utilizing the deposition techniques. Finally, general conclusions and prospects for future advanced thin film deposition techniques in the field of lithium-ion batteries are presented.