We investigated the properties of hydrogenated amorphous silicon oxide (a-Si 1Àx O x :H) deposited near the phase transition between amorphous and microcrystalline structures. a-Si 1Àx O x :H films were prepared by plasma-enhanced chemical vapor deposition using a gas mixture of silane, hydrogen, and carbon dioxide. The film structure was changed from amorphous to microcrystalline phase by increasing hydrogen dilution. Optical and electrical characterizations revealed that wide-gap a-Si 1Àx O x :H films were deposited under phase transition conditions. We also fabricated a-Si 1Àx O x :H single-junction p-i-n solar cells by varying the hydrogen dilution for the i-layer. The solar cells showed a maximum open circuit voltage of 1.04 V (J sc ¼ 7:92 mA/cm 2 , FF ¼ 0:64, E ff ¼ 5:2%) when the i-layer was deposited under phase transition conditions.
Multi-junction silicon-based thin-film concentrator solar cells are promising candidate to achieve both low-cost and high-efficiency. For the application of silicon-based thin film solar cells to concentrator photovoltaics, it is required to be revealed the light intensity dependence of the performance of silicon-based thin film solar cells. From these reasons, in this study both calculation and experimental studies were conducted with several types of single-junction and multi-junction tandem solar cells.
From both simulation and measurement results, we observed that double-and triple-junction solar cells achieve high open-circuit voltage and large logarithmic increment in open-circuit voltage with increasing lightintensities. On the other hand, it became clear that the drop of fill factor is required to be improved for the realization of the multi-junction silicon-based thin-film solar cells with very high efficiency under low concentration ratios of sunlight.
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