Currently, researchers spend significant time manually searching through large volumes of data produced during scanning probe imaging to identify specific patterns and motifs formed via self-assembly and self-organization. Here, we use a combination of Monte Carlo simulations, general statistics, and machine learning to automatically distinguish several spatially correlated patterns in a mixed, highly varied data set of real AFM images of self-organized nanoparticles. We do this regardless of feature-scale and without the need for manually labeled training data. Provided that the structures of interest can be simulated, the strategy and protocols we describe can be easily adapted to other self-organized systems and data sets.

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A wide range of techniques can be considered for segmentation of images of nanostructured surfaces. Manually segmenting these images is time-consuming and results in a user-dependent segmentation bias, while there is currently no consensus on the best automated segmentation methods for particular techniques, image classes, and samples. Any image segmentation approach must minimise the noise in the images to ensure accurate and meaningful statistical analysis can be carried out. Here we develop protocols for the segmentation of images of 2D assemblies of gold nanoparticles formed on silicon surfaces via deposition from an organic solvent. The evaporation of the solvent drives far-from-equilibrium self-organisation of the particles, producing a wide variety of nano-and micro-structured patterns. We show that a segmentation strategy using the U-Net convolutional neural network outperforms traditional automated approaches and has particular potential in the processing of images of nanostructured systems.