Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the innovative technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. HighlightsDc reactive sputtering was implemented with the reactive gas pulsing process.Combination of the structural analyses allowed determining the composition of different phases.HRTEM pointed out the dependence between electrical properties and nanometric and periodic Ti/fcc-TiO/a-TiO 2 multilayers.