Recently, both PSI 1 and ASML 2 illustrated champion EUVL resolution using slow, non-chemically amplified inorganic resists. However, the requirements for EUVL manufacturing require simultaneous delivery of high resolution, good sensitivity, and low line edge/width roughness (LER/LWR) on commercial grade hardware. As a result, we believe that new classes of materials should be explored and understood. This paper focuses on our efforts to assess metal oxidebased nanoparticles as novel EUV resists 3 . Various spectroscopic techniques were used to probe the patterning mechanism of these materials. EUV exposure data is presented to investigate the feasibility of employing inorganic materials as viable EUV resists.

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