We
describe the synthesis and characterization of three platinum(II)
ω-alkenyl complexes of stoichiometry Pt[CH2CMe2(CH2)
x
CHCH2]2 where x is 0, 1, or 2, as well
as some related platinum(II) compounds formed as byproducts during
their synthesis. The ω-alkenyl ligands in all three complexes, cis-bis(η1,η2-2,2-dimethylbut-3-en-1-yl)platinum
(2), cis-bis(η1,η2-2,2-dimethylpent-4-en-1-yl)platinum (3), and cis-bis(η1,η2-2,2-dimethylhex-5-en-1-yl)platinum
(4), bind to Pt by means of a Pt–alkyl sigma bond
at one end of the ligand chain and a Pt–olefin pi interaction
at the other; the olefins reversibly decomplex from the Pt centers
in solution. The good volatility of 3 (10 mTorr at 20
°C), its ability to be stored for long periods without decomposition,
and its stability toward air and moisture make it an attractive platinum
chemical vapor deposition (CVD) precursor. CVD of thin films from 3 shows no nucleation delay on several different substrates
(SiO2/Si, Al2O3, and VN) and gives
films that are unusually smooth. At 330 °C in the absence of
a reactive gas, the precursor deposits platinum containing 50% carbon,
but in the presence of a remote oxygen plasma, the amount of carbon
is reduced to below the Rutherford backscattering spectroscopy (RBS)
detection limit without affecting the film smoothness. Under hot wall
CVD conditions at 250 °C in the absence of a co-reactant, 72%
of the carbon atoms in 3 are released as hydrogenated
products (largely 4,4-dimethylpentenes), 22% are released as dehydrogenated
products (all of which are the result of skeletal rearrangements),
and 6% remain in the film. Some conclusions about the CVD mechanism
are drawn from this product distribution.
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