This paper describes a substrate integrated waveguide (SIW) based filter at K band fr equency on silicon substrate. TMAH etching is used to fo rm the via-holes for SIW cavities. Simulations and comparison of TMAH and Deep reactive ion etching (DRIE) etched cavity has been presented. A micro-machined filter is made fr om rectangular cavities integrated into a silicon substrate and is fed by coplanar waveguide (CPW) transmission-lines through current probes. Simulated filter using TMAH etching shows insertion loss of O.29dB and return loss of 21.96 dB.

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