GaAsN was grown by molecular beam epitaxy equipped with a radio frequency nitrogen plasma source. The N incorporation behaviors were investigated using a series of samples grown at different growth rates, As4/Ga ratios, and nitrogen fluxes within a growth temperature range from 420 to 560 °C. It was found that, for the GaAsN grown at higher growth rates (0.4–1.3 ML/s), the N concentration increased linearly following a decrease in growth rate, and kept independent of the arsenic pressure. For the GaAsN grown at lower growth rate (0.1–0.3 ML/s), the N concentration was significantly influenced by the arsenic pressure, and the increase in N concentration with decreasing growth rate follows a sublinear manner. We propose a model based on the incorporation competition of group V elements (N and As) under N underpressure and overpressure conditions, which can explain the different behaviors well.

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Self-assembled In0.9Ga0.1As, In0.9Al0.1As, and InAs quantum dots (QD) were fabricated in an InAlAs matrix lattice-matched to an InP substrate by molecular beam epitaxy. Preliminary characterizations were performed using transmission electron microscopy, photoluminescence, and reflection high-energy electron diffraction. Experimental results reveal clear differences in QD formation, size distribution, and luminescence between the InAs and In0.9(Ga/Al)0.1As samples, which show the potential of introducing ternary compositions to adjust the structural and optical properties of QDs on an InP substrate.

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