Hydrogenated amorphous and nano-crocrystalline silicon thin films were grown by very-high-frequency plasma-enhanced chemical vapor deposition (VHF-PECVD, 60 MHz). In this paper, we report the defects of nano-crystallites embedded in an amorphous matrix of hydrogenated silicon alloy (a-Si:H) thin film as investigated by spectroscopic ellipsometry (SE). The peak intensity and position of the imaginary part of the dielectric constant (epsilon2) as a function of the energy show various material states, including a-Si:H (3.5 eV) and nc-Si (4.2 eV), along with the absorption coefficient, thickness, optical gap, and the characteristics of the defects. The ratio of the characteristic Raman features, the TA/LO and LA/LO ratio, is related to the defect states in the films. It was correlated to the SE data. Following this, we look into the systematic change in the crystallinity of the film from the SE results. Quantized crystallinity values from the SE data show good agreement by more than 88.75% with the crystallinity information obtained through Raman spectroscopy.

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In this report, we have investigated on the defect state of diborane (B2H6) doped wide bandgap hydrogenated amorphous silicon oxide (p-type a-SiO:H) films prepared using silane (SiH4), hydrogen (H2) and nitrous oxide (N2O) in a radio frequency (RF) plasma enhanced chemical vapor deposition (PECVD) system with different hydrogen dilutions. The films prepared with higher hydrogen dilution show lower Urbach energy (Eu), lower microstructure (R*), lower short and medium range disorder (omegaTO, Gamma(TO), I(TA)/I(TO), I(LA)/I(TO)), higher dark conductivity (sigma d) and higher refractive index (n) with high optical gap (Eg). Eu decreases from 248 meV to 153 meV, and R* decreases from 0.46 to 0.26, Raman peak omegaTO-TO mode position shifts from 480.24 to 483.28, GammaTO-full width half maximum of omegaTO decreases from 78.16 to 63.87, I(TA)/I(TO)-the ratio of integrated area of TA and TO mode decreases from 0.624 to 0.474, I(LA)/I(TO)-the ratio of integrated area of LA and TO mode deceases from 0.272 to 0.151, sigma d increases from 4.6 x 10(-7) S/cm to 1.1 x 10(-6) S/cm, n increases from 3.70 to 3.86. Reduced Nd, Eu and R* at wide Eg indicates that the films are more useful for solar cell window layer. Applying this layer to a single junction solar cell shows open circuit voltage (Voc) = 0.80 V, short circuit current density (Jsc) = 16.3 mA/cm2, fill factor (FF) = 72%, efficiency (eta) = 9.4%.

In this paper, we report the stability of hydrogenated amorphous silicon (a-Si:H) thin films and solar cells for various carrier injections. The intrinsic films were prepared with different hydrogen dilutions. We observed that the a-Si:H film had a 25.4% decline in photocurrent due to the carrier injection. The photoluminescence peak within 1.1 to 1.7 eV increased towards the lower photon energy, due to the bias stress. The Urbach energy for the film degraded from 59 to 85 meV under a similar condition. We also observed a 24% drop in efficiency of the solar cell, due to a forward bias stress for 10 h.