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Titanium dioxide (TiO2) nanothin films were deposited on unheated substrate, the glass slide and Si-wafer, by DC reactive magnetron sputtering with different substrate-target distance (dst), in range of 8 to 14 cm. The structural, surface morphology and transmittance spectrum of TiO2thin films were characterized by grazing-incidence X-ray diffraction (GI-XRD), atomic force microscopy (AFM) and spectrophotometer, respectively. XRD results show that as-deposited TiO2films with short substrate-target distance have only anatase crystal structure corresponding to the anatase in (101) and (200) plane, and turn to be amorphous with long substrate-target distance. The thickness and roughness varied from 50 nm to 142 nm and 1.6 nm to 3.5 nm, respectively. The as-deposited TiO2films exhibited high visible transmittance. The optical constants of the films, refractive index (n) and extinction coefficient (k), were calculated by Swanepoel method, at 550 nm, was about 2.43 - 2.76 and 0.082 - 0.187, respectively. The energy band gap (Eg) of the as-deposited TiO2films in the range of 3.20 - 3.25 was observed.

Titanium dioxide (TiO2) thin films have been deposited on Si-wafer and glass slide by DC reactive magnetron sputtering technique at different O2 gas flow rates. The crystal structure was characterized by grazing-incidence X-ray diffraction (GIXRD), surface morphology was analyzed by atomic force microscopy (AFM) and disinfection of surfaces by photo catalytic oxidation with TiO2 and UV light irradiation. The results showed that, from GIXRD results, all as-deposited TiO2 films have crystal structure of TiO2 corresponding to the A(101) and A(200). AFM results showed that the film thicknesses increase from 183 nm to 238 nm with increasing of O2 gas flow rate, while the film roughness was in range of 4.8 nm to 5.9 nm. The as-deposited anatase TiO2 thin film in this work can kill the bacteria when expose to the UV light.

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