AcknowledgmentThanks are due to M. Asada for chemical analysis. Study of Phase Equilibfjla in Titanium-Oxygen System Within the TiOl.,-TiOz Region, J. Electrochem. SOC., 110 [I] 92-93 (1963). (c) P. Kofstad, "Thermogravimetric Studies of Defect Structure of Rutile (TiOz)," Phys. Chem. Solids, 23 [lo] 1579-86

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Vapor deposition of S i c from methyltrichlorosilane in a fluidized bed and the microstructure of the deposit were studied over a range of deposition temperatures, carrier gas flow rates, and reactant fluxes. The rate-determining factor for the deposition of Sic was the rate of supply of reactant. The microstructure of vapor-deposited Sic was primarily dependent on the deposition temperature ; however, carrier gas flow rate and reactant flux had a secondary influence on microstructure. At low temperatures and high carrier gas flow rates, laminar deposits containing excess silicon were produced. At higher temperatures and lower carrier gas flow rates deposits were characterized by faulted columnar grains.The grain diameter increased from about l p at 1400°C to about 15p at 1800°C.The grain size also increased, but less markedly, with increasing reactant flux. T h e deposits characterized by columnar grains were predominantly @-Sic with traces of a-SiC and excess carbon.

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