This paper describes a simple strategy for DNA immobilization on chemically modified and patterned silicon surfaces. The photochemical modification of hydrogen-terminated Si(111) with undecylenic acid leads to the formation of an organic monolayer covalently attached to the surface through Si-C bonds without detectable reaction of the carboxylic acid group, providing indirect support of a free radical mechanism. Chemical activation of the acid function was achieved by a simple chemical route using N-hydroxysuccinimide (NHS) in the presence of N-ethyl-N'-(3-dimethylaminopropyl) carbodiimide hydrochloride. Single strand DNA with a 5'-dodecylamine group was then coupled to the NHS-activated surface by amide bond formation. Using a previously reported chemical patterning approach, we have shown that DNA can be immobilized on silicon surfaces in spatially well-resolved domains. Methoxytetraethyleneglycolamine was used to inhibit nonspecific adsorption. The resulting DNA-modified surfaces have shown good specificity and chemical and thermal stability under hybridization conditions. The sequential reactions on the surface were monitored by ATR-FTIR, X-ray Photoelectron Spectroscopy, and fluorescence spectroscopy.

Vous avez des questions? Nous pouvons vous aider. Pour communiquer directement avec un auteur, consultez la première page de la revue dans laquelle son article a été publié afin de trouver ses coordonnées. Si vous n'arrivez pas à les repérer, communiquez avec nous à PublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. Questions? Contact the NRC Publications Archive team atPublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. If you wish to email the authors directly, please see the first page of the publication for their contact information. NRC Publications Archive Archives des publications du CNRCThis publication could be one of several versions: author's original, accepted manuscript or the publisher's version. / La version de cette publication peut être l'une des suivantes : la version prépublication de l'auteur, la version acceptée du manuscrit ou la version de l'éditeur. For the publisher's version, please access the DOI link below./ Pour consulter la version de l'éditeur, utilisez le lien DOI ci-dessous.Access and use of this website and the material on it are subject to the Terms and Conditions set forth at NRC Publications Record / Notice d'Archives des publications de CNRC:http://nparc.cisti-icist.nrc-cnrc.gc.ca/eng/view/object/?id=2b9ba878-0bb9-4dc2-87a4-1fa06edbed60 http://nparc.cisti-icist.nrc-cnrc.gc.ca/fra/voir/objet/?id=2b9ba878-0bb9-4dc2-87a4-1fa06edbed60 We report on the electroformation of mixed bilayers of rigid (1,4-benzenedimethanethiol) and flexible (1,6-hexanedithiol) dithiols on Au(111) from alkaline aqueous solution. These bilayers are formed by first electrodepositing a monolayer of vertically aligned dithiols. The unreacted dithiols are then oxidatively dimerized with the other dithiols, and a bilayer is formed. ACIS (ac impedance spectroscopy) measurements indicate that the monolayer of the rigid dithiol is a better substrate for dimerization than the flexible dithiol. ACIS also reveals that the electroformation of a bilayer is more complete, and the bilayer has fewer defects than one obtained through chemical incubation. Infrared reflection-absorption spectroscopy provides proof for mixed-bilayer formation of the alkanedithiol with the benzenedimethanethiol having its methylene groups deuterated. The mechanism for bilayer formation via the oxidative dimerization of thiols is supported by high-resolution electron energy loss spectra of bilayers, which show a S-S stretch at 515 cm -1 . Our results show that this electrochemical approach is a viable methodology for the formation of complex organic interfaces.