Two-dimensional (2D) tin (Sn2+)-based perovskites
have
achieved remarkable advancements in (opto)electronic devices. However,
fabricating high-quality and reproducible Sn halide perovskite thin
films remains challenging due to uncontrollably fast crystallization.
To overcome this issue, dimethyl sulfoxide has been incorporated as
an indispensable strategy to form Lewis acid–base adducts but
also has been proven to induce an irreversible Sn2+ oxidization
effect. As the crystalline films grow directly from solution, a better
understanding of precursor colloidal chemistry and the film formation
process is critical. In this study, we report a universal solution
aging approach to fabricate high-quality and reliable 2D Ruddlesden–Popper
and Dion–Jacobson Sn2+ perovskite films and devices.
The proper solution aging stabilizes the precursor colloids by eliminating
aggregated complex and unreacted precursor clusters in the fresh precursor,
leading to homogeneous nucleation/crystallization and film growth.
The precursor aging reduced film defect density by nearly 2 orders
of magnitude and improved charge transport mobility by over 5 times.
This study can inspire the community to understand the deposition
mechanism for high-quality Sn2+ perovskite thin films and
promote the development of high-performance and reproducible Sn2+ perovskite based (opto)electronic devices.
Metal halide perovskite optoelectronic devices have made significant progress over the past few years, but precise control of charge carrier density through doping is essential for optimizing these devices. In this study, the potential of using an organic salt, N,N‐dimethylanilinium tetrakis(pentafluorophenyl)borate, as a dopant for Sn‐based perovskite devices, is explored. Under optimized conditions, the thin film transistors based on the doped 2D/3D perovskite PEAFASnI3 demonstrate remarkable improvement in hole mobility, reaching 7.45 cm2V−1s−1 with a low subthreshold swing and the smallest sweep hysteresis (ΔVhysteresis = 2.27 V) and exceptional bias stability with the lowest contact resistance (2.2 kΩ cm). The bulky chemical structure of the dopant prevents it from penetrating the perovskite lattice and also surface passivation against Sn oxidation due to its hydrophobic nature surface. This improvement is attributed to the bifunctional effect of the dopant, which simultaneously passivates defects and improves crystal orientation. These findings provide new insights into potential molecular dopants that can be used in metal halide perovskite devices.
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