This paper gives a review on the state-of-the-art of the application of plasmas for the preparation of optical waveguides. Both high and low pressure plasmas initiating a homogeneous or a heterogeneous reaction are used for the fabrication of high quality low-loss optical fibers. Both inside and outside deposition processes are presented and compared. Among these the Plasma Impulse CVD (PICVD-process) is discussed in more detail.
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