A direct one-step nano-gold printing process from a HAuCl4 solution precursor is demonstrated using an atmospheric-pressure plasma jet.

WO3/graphene composite minimizes the polysulfide dissolution problem in the lithium–sulfur (Li–S) battery systems while exhibiting an excellent battery performance.

Atomically thin graphene holds exceptional promise to enable new functionalities and drastically improve performance of electronic, energy, sensing, and bio-medical devices. One of the most promising approaches to device-compatible graphene synthesis is chemical vapour deposition on a copper catalyst; this technique however is limited by very high temperatures (∼900 °C) and a lack of control as well as post-growth separation from the catalyst. We demonstrate and explain how, through the use of a plasma, a graphene film containing single layer graphene can be grown at temperature as low as 220 °C, the process can be controlled and an instant and water-mediated decoupling mechanism is realised. Potential use of our films in flexible transparent conductive films, electrical devices and magneto-electronics is demonstrated. Considering the benefits of catalyst reuse, energy efficiency, simplicity, and environmental friendliness, we present this versatile plasma process as a viable alternative to many existing graphene production approaches.