In this paper, self-powered ultraviolet (UV) photodetectors with high response performance based on Ga 2 O 3 /p-GaN were fabricated by metal−organic chemical vapor deposition (MOCVD). The effects of different crystal phases of Ga 2 O 3 (including a, ε, ε/β, and β) grown on p-GaN films on the performance of photodetectors were systematically studied. Moreover, an in situ GaON dielectric layer improved the responsivity of Ga 2 O 3 /p-GaN photodetectors by 20 times. All Ga 2 O 3 /p-GaN photodetectors showed self-power capability without bias. An ultralow dark current of 3.08 pA and a I photo /I dark ratio of 4.1 × 10 3 (1.8 × 10 3 ) under 254 nm (365 nm) light were obtained for the β-Ga 2 O 3 /p-GaN photodetector at 0 V bias. Furthermore, the β-Ga 2 O 3 /p-GaN photodetector showed excellent sensitivity with a high responsivity of 3.8 A/W (0.83 A/W), a fast response speed of 66/36 ms (36/73 ms), and a high detectivity of 1.12 × 10 14 Jones (2.44 × 10 13 Jones) under 254 nm (365 nm) light at 0 V bias. The carrier transport mechanism of the Ga 2 O 3 /p-GaN self-powered photodetector was also analyzed through the device energy band diagram. This work provides critical information for the design and fabrication of high-performance self-powered Ga 2 O 3 /p-GaN UV photodetectors, opening the door to a variety of photonic systems and applications without an external power supply.

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