Abstract-Fluctuations are inherent to any fabrication process. Integrated circuits and micro-electro-mechanical systems are particularly affected by these variations, and due to high quality requirements the effect on the devices' performance has to be understood quantitatively. In recent years it has become possible to model the performance of such complex systems on the basis of design specifications, and model-based Sensitivity Analysis has made its way into industrial engineering. We show how an efficient Bayesian approach, using a Gaussian process prior, can replace the commonly used brute-force Monte Carlo scheme, making it possible to apply the analysis to computationally costly models. We introduce a number of global, statistically justified sensitivity measures for design analysis and optimization. Two models of integrated systems serve us as case studies to introduce the analysis and to assess its convergence properties. We show that the Bayesian Monte Carlo scheme can save costly simulation runs and can ensure a reliable accuracy of the analysis.

Designs of micro electro-mechanical devices need to be robust against fluctuations in mass production. Computer experiments with tens of parameters are used to explore the behavior of the system, and to compute sensitivity measures as expectations over the input distribution. Monte Carlo methods are a simple approach to estimate these integrals, but they are infeasible when the models are computationally expensive. Using a Gaussian processes prior, expensive simulation runs can be saved. This Bayesian quadrature allows for an active selection of inputs where the simulation promises to be most valuable, and the number of simulation runs can be reduced further. We present an active learning scheme for sensitivity analysis which is rigorously derived from the corresponding Bayesian expected loss. On three fully featured, high dimensional physical models of electro-mechanical sensors, we show that the learning rate in the active learning scheme is significantly better than for passive learning

Abstract-The final properties of sophisticated products can be affected by many unapparent dependencies within the manufacturing process, and the products' integrity can often only be checked in a final measurement. Troubleshooting can therefore be very tedious if not impossible in large assembly lines. In this paper we show that Feature Selection is an efficient tool for serial-grouped lines to reveal causes for irregularities in product attributes. We compare the performance of several methods for Feature Selection on real-world problems in mass-production of semiconductor devices.Note to Practitioners-We present a data based procedure to localize flaws in large production lines: using the results of final quality inspections and information about which machines processed which batches, we are able to identify machines which cause low yield.