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Interfaces between 4H-SiC and Si O 2 : Microstructure, nanochemistry, and near-interface traps J. Appl. Phys. 97, 034302 (2005); 10.1063/1.1836004Hall mobility and free electron density at the SiC/SiO 2 interface in 4H-SiC Appl.

The memory effect in floating nanodot gate field-effect-transistor (FET) was investigated by fabricating biomineralized inorganic nanodot embedded metal–oxide–semiconductor (MOS) devices. Artificially biomineralized cobalt (Co) oxide cores accommodated in ferritins were utilized as a charge storage node of floating gate memory. Two dimensional array of Co oxide core accommodated ferritin were, after selective protein elimination, buried into the stacked dielectric layers of MOS capacitors and MOSFETs. Fabricated MOS capacitors and MOSFETs presented a clear hysteresis in capacitance–voltage (C–V) characteristics and drain current–gate voltage (I D–V G) characteristics, respectively. The observed hysteresis in C–V and I D–V G are attributed to the electron and hole confinement within the embedded ferritin cores. These results clearly support the biologically synthesized cores work as charge storage nodes. This work proved the feasibility of the biological path for fabrication of electronic device components.

Degradation of Ga2O3–In2O3–ZnO (GIZO) thin-film transistors (TFTs), which are promising for driving circuits of next-generation displays, was studied. We found a degradation mode that was not observed in silicon TFTs. A parallel shift without any change of the transfer curve was observed under gate voltage stress. Judging from the bias voltage dependences we confirmed that the mode was mainly dominated by a vertical electric field. Thermal distribution was measured to analysis the degradation mechanism. Joule heating caused by drain current was observed; however, a marked acceleration of degradation by drain bias was not found. Therefore, we concluded that Joule heating did not accelerate degradation. Recovery of electrical properties independent of stress voltage were observed.

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