Hydroxyl groups of dextrin, which is a base polymer, were modified with photosensitive groups to the extent that water solubility could be maintained, and water-soluble plantderived photosensitive materials were created. This material can be applied to a silicon wafer using spin coating, exposed by a mask contact exposure system (LTCET-500: Litho Tech Japan), and then developed with water to enable fine processing, which is derived from plants for photolithography. It has been demonstrated that adaptation to water-soluble nanopatterning materials is possible. Since the base polymer is derived from plants and does not use organic solvents or highly toxic strong alkaline developers, it is useful as a low environmental load patterning material.

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