III-V semiconductor nanowires have attracted intensive research interest because of their promising optical and electronic properties that can be manipulated by tailoring nanowire composition and morphology. Therefore, it is crucial to measure and control the diameter distribution of the grown nanowires. In this study, we analyze the diameter distribution of Aucatalyzed InAs nanowires. Au colloidal nanoparticles dispersed on InAs (111) B substrates and nanoparticles obtained by the thermal annealing of Au films were used as catalysts for InAs nanowire growth. The annealing time and temperature, the thickness of the Au film and the colloid sizes were systematically varied not only to understand their influence on nanowire diameter distribution, but also to find the optimal parameters for realizing samples with uniform and controlled diameter distribution. Morphological characterization was performed by scanning electron microscopy measurements and the image analysis was carried out using in-housedeveloped automated image analysis software to accurately determine the diameter distribution of the nanowires. A description of the image analysis software is also presented. The thermal annealing of films turned out to be the most suitable method for uniformity and density control, while the colloidal nanoparticles yielded narrow and more reproducible diameter distributions.

We present experimental data on the length distributions of InAs nanowires grown by chemical beam epitaxy with Au catalyst nanoparticles obtained by thermal dewetting of Au film, Au colloidal nanoparticles and In droplets. Poissonian length distributions are observed in the first case. Au colloidal nanoparticles produce broader and asymmetric length distributions of InAs nanowires. However, the distributions can be strongly narrowed by removing the high temperature annealing step. The length distributions for the In-catalyzed growth are instead very broad. We develop a generic model that is capable of describing the observed behaviors by accounting for both the incubation time for nanowire growth and secondary nucleation of In droplets. These results allow us to formulate some general recipes for obtaining more uniform length distributions of III-V nanowires.

We demonstrate tunable bistability and a strong negative differential resistance in InAs/GaSb core-shell nanowire devices embedding a radial broken-gap heterojunction. Nanostructures have been grown using a catalyst-free synthesis on a Si substrate. Current-voltage characteristics display a top peak-to-valley ratio of 4.8 at 4.2 K and 2.2 at room temperature. The Esaki effect can be modulated-or even completely quenched-by field effect, by controlling the band bending profile along the azimuthal angle of the radial heterostructure. Hysteretic behavior is also observed in the presence of a suitable resistive load. Our results indicate that high-quality broken-gap devices can be obtained using Au-free growth.

We investigate a growth mechanism which allows for the fabrication of catalyst-free InAs nanowires on Si (111) substrates by chemical beam epitaxy. Our growth protocol consists of successive low-temperature (LT) nucleation and high-temperature growth steps. This method produces non-tapered InAs nanowires with controllable length and diameter. We show that InAs nanowires evolve from the islands formed during the LT nucleation step and grow truly catalyst-free, without any indium droplets at the tip. The impact of different growth parameters on the nanowire morphology is presented. In particular, good control over nanowire aspect ratio is demonstrated. A better understanding of the growth process is obtained through the development of a theoretical model combining the diffusion-induced growth scenario with some specific features of the catalyst-free growth mechanism, along with the analysis of the V/III flow ratio influencing material incorporation. As a result, we perform a full mapping of the nanowire morphology versus growth parameters which provides useful general guidelines on the self-induced formation of III-V nanowires on silicon.