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Magnesium fluoride and Yttrium fluoride antireflection multilayer thin films have been deposited on to well cleaned BK-7 Glass substrate in Vacuum of 2x10 -5 mbar using physical vapour deposition technique. Surface morphology analysis by AFM of different multilayer structures deposited by thermal evaporation method i.e., Single layer, double layer, three layer and four layer thin films were presented in this study. The main objective of this study was to investigate the influence of thickness of various antireflection multilayer thin films on the effect of surface roughness and grain size of the particles. The thickness of the films has been determined by quartz crystal monitor method. The surface morphology studies are performed using Atomic force Microscopy (AFM) techniques. AFM was the best tool to investigate the surface smoothness and to find the grain size of the particles. The grain size is calculated for all the films of different thickness.

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