Laser and electron-beam initiation of the combustion process of energy-saturated composite films were studied. Composites were produced from porous silicon, a fluorine-containing polymer, and graphene. It is shown that the impact of a high-current electron beam of nanosecond duration does not lead to the excitation of the combustion process. Moreover, the process of film combustion during laser initiation is accompanied in some cases by the appearance of a zone of secondary flame and white smoke. Keywords: porous silicon, energy-saturated composite, laser initiation, electron-beam initiation, combustion.

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The method of determination combustion rate of powdered porous silicon with limited space is presented. The values of the combustion rates of porous silicon are close to the values of the rates of explosives. Keywords: porous silicon, combustion rate

With a decrease in the thickness of the walls separating the space of pores in porous semiconductors, the potential energy of interaction between an electron and a donor (or a hole and an acceptor) can become greater than the kinetic energy of a free charge carrier. As a consequence, such interlayers lose their conductivity and transit into the dielectric state (Mott phase transition). With regard to the conditions of electrochemical pore formation, this means that as the pore channels approach each other during anodic etching to a distance at which the current flow through the wall that separates them stops, the potential of its surface ceases to be determined by the external electric bias and the electrochemical process, that leads to a further decrease in the thickness of such a wall, stops. Expressions are obtained for the limiting thickness of the walls of pores formed in degenerate semiconductors of n- and p-type conductivity. In contrast to the well-known model that relates the loss of conductivity by pore walls to the combination of space charge layers, the proposed model allows a consistent explanation for the experimental data for both n- and p-type silicon with doping levels above 1018 cm-3. Keywords: thickness limitation, pore formation, silicon, donor, acceptor.