The quantum point contact (QPC) model for dielectric breakdown is used to explain the electron transport mechanism in HfO2-based resistive random access memories (ReRAM) with TiN(30 nm)\HfO2(5 nm)\Hf(10 nm)\TiN(30 nm) stacks. Based on experimental I-V characteristics of bipolar HfO2-based ReRAM, we extracted QPC model parameters related to the conduction mechanism in several devices in order to make a statistical study. In addition, we investigated the temperature effect on the conduction mechanism and compared it with the QPC model. Based on these experimental results, we show that the QPC model agrees well with the conduction behavior of HfO2-based ReRAM memory cells.

This work presents a study based on electro-optical numerical simulations of the impact of geometrical and doping parameters on main figures of merit of crystalline silicon back-contact back-junction solar cells. State-of-the-art physical models in combination with two-dimensional simulations performed by a TCAD tool have been adopted to carry out an extensive and detailed analysis of the influence of many fabrication parameters on performance. The studied design parameters are the doping level in front surface field (FSF), back surface field (BSF) and emitter, and the main geometrical parameters. A doping level value that allows the maximization of the efficiency for the three regions can be clearly identified. In particular, for BSF and emitter, an efficiency degradation is observed for relatively lower doping values and is ascribed to the higher contact recombination while for higher doping values the Auger recombination plays a significant role in reducing the ultimate efficiency. In FSF region the recombination due to defects at the front interface is the main limiting mechanisms for efficiency. On the basis of our analysis, a marked sensitivity of the efficiency to the gap and pitch size is caused by the series resistance increase. The efficiency exhibits a maximum value for an emitter coverage fraction (R) of 85 %. However, in the case of lower emitter coverage, Auger, Shockley–Read–Hall (SRH): in bulk and at interfaces are detrimental for the cell conversion efficiency

No abstract

No abstract

No abstract