Access and use of this website and the material on it are subject to the Terms and Conditions set forth at Optically produced arrays of planar nanostructures inside fused silica Bhardwaj, V. R.; Simova, E.; Rajeev, P. P.; Hnatovsky, C.; Taylor, R. S.; Rayner, D. M.; Corkum, P. B.
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We fabricate microchannels in fused silica by femtosecond laser irradiation followed by etching in diluted hydrofluoric acid. We show a dramatic dependence of the etch rate on the laser polarization, spanning 2 orders of magnitude. We establish the existence of an energy-per-pulse threshold at which etching of the laser-modified zones becomes highly polarization selective. The enhanced selective etching is due to long-range, periodic, polarization-dependent nanostructures formed in the laser-modified material.
Femtosecond laser radiation tightly focused in bulk fused silica is used to generate self-ordered nanogratings when the sample is translated under the lens at constant speed. The nanogratings are preserved over a length scale of millimeters. We demonstrate that nanogratings are formed for all pulse durations tested, ranging from 40to500fs, and that the pulse energy threshold for this phenomenon increases with decreasing pulse duration. We use high spatial resolution diagnostics based upon selective chemical etching followed by atomic force microscopy and scanning electron microscopy to reveal the morphology of the nanogratings.
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