The effects of microstructure on the gap states of hydrogen diluted and undiluted hydrogenated amorphous silicon (a-Si:H) thin film materials and their solar cells have been investigated. In characterizing the films the commonly used methodology of relating just the magnitudes of photocurrents and subgap absorption, α(E), was expanded to take into account states other than those due to dangling bond defects. The electron mobility-lifetime products were characterized as a function of carrier generation rates and analysis was carried out of the entire α(E) spectra and their evolution with light induced degradation. Two distinctly different defect states at 1.0 and 1.2 eV from the conduction band and their contributions to carrier recombination were identified and their respective evolution under 1 sun illumination characterized. Direct correlations were obtained between the recombination in thin films with that of corresponding solar cells. The effects of the difference in microstructure on the changes in these two gap states in films and solar cells were also identified It is found that improved stability of protocrystalline Si:H can in part be attributed to the reduction of the 1.2 eV defects. It is also shown that ignoring the presence of multiple defects leads to erroneous conclusions being drawn about the stability of a-Si:H and SWE.
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Cesium-iodide (CsI)-coated graphite cathodes are promising electron sources for high power microwave generators, but the mechanism driving the improved emission is not well understood. Therefore, an ab initio modeling investigation on the effects of thin CsI coatings on graphite has been carried out. It is demonstrated that the CsI coatings reduce the work function of the system significantly through a mechanism of induced dipoles. The results suggest that work function modification is a major contribution to the improved emission seen when CsI coatings are applied to C.
Dark forward bias current, JD-V, characteristics offer a probe for characterizing carrier recombination and the defect states in the intrinsic layers of hydrogenated amorphous silicon (a-Si:H) solar cells. Detailed studies were carried out on such characteristics for the cells with optimized p/i interfaces and high quality i-layers in which the current transport is bulk recombination dominated. It was found that the diode quality factor n is not a constant with bias voltages as has been generally considered. Instead, it can be best described through the bias dependent differential diode quality factors, n(V) = [kT/q]−1[d(lnJD)/dV]−1, whose magnitude and shape reflect the gap state distribution in the corresponding bulk i-layers. The n(V) characteristics obtained on cell structures with both hydrogen diluted and undiluted i-layers have been utilized in characterizing the differences in the distribution of defect states in the two i-layers both in annealed state as well as after creating light induced defects. In the characterization of the Staebler-Wronski Effect (SWE) using JD-V characteristics, a newphenomenon is observed – relaxation of light induced defect states created by 1 sun illumination at 25°C, which is also found in the follow-on studies on the photo-conductivities of corresponding thin films.
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