Diffusion of titanium was examined in the field emission microscope using the fluctuation autocorrelation method. A thick titanium layer (about three monolayers) deposited on a tungsten tip was used. A temperature range of 1260-1410 K was found where diffusion can be described in a hydrodynamic approximation. In this temperature range the diffusion coefficient seems to comply with Arrhenius rule for the activation energy of 1.31 eV and Do = 3 x 10-7 cm2 /s.

Activation energy for thermal desorptioii of potassium from clean and sulfur covered surfaces of nickel was determined by means of the field emission method. For the low potassium coverage limit (θK 0.02) the desorption was detected from the whole emitter surface in the temperature range of 825-1000 K for the atoms and of 725-825 K for the species of atoms and ions of the potassium. The activation energies of neutral desorption were found to be EaNi = 3.8 eV for the clean nickel and Es /Ni = 3.0 eV for the sulfur covered nickel, θs 0.5. The activatioii energies for the desorptioii of the species of atoms and ions increased from E ti = 2.5 eV for the clean nickel to Ea+iS/Ni = 2.9 eV for the sulfur covered nickel θs 0.5. Also, a value of Ea+iS'/Ni = 4.1 eV was found for a higher coverage of sulfur, θs 1. The results are discussed in terms of Gurney model.

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