We deposited a p-i-n structure device with alternative amorphous Si (a-Si) and amorphous SiC (a-SiC) multilayers as an intrinsic layer in a plasma-enhanced chemical vapor deposition (PECVD) system. A KrF pulsed excimer laser-induced crystallization of a-Si/a-SiC stacked structures was used to prepare Si quantum dots (Si QDs)/SiC multilayers. The formation of Si QDs with an average size of 4 nm was confirmed by Raman spectra, whereas the layered structures were revealed by cross-sectional transmission electron microscopy. Electroluminescence (EL) devices containing Si QDs/SiC multilayers embedded in a p-n junction were fabricated, and the device performance was studied and compared with the reference device without the p-i-n structure. It was found that the turn-on voltage was reduced and that luminescence efficiency was significantly enhanced by using the p-i-n device structure. The recombination mechanism of carriers in a Si-QD-based EL device was also discussed, and the improved device performance can be attributed to the enhanced radiative recombination probability in a p-i-n EL device.

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