Memristors are expected to be one of the key building blocks for the development of new bio-inspired nanoelectronics. Memristive effects in transition metal oxides are usually linked to the electromigration at the nanoscale of charged oxygen vacancies (OV). In this paper we address, for Pt/TiOx/TaOy/Pt devices, the exchange of OV between the device and the environment upon the application of electrical stress. From a combination of experiments and theoretical simulations we determine that both TiOx and TaOy layers oxidize, via environmental oxygen uptake, during the electroforming process. Once the memristive effect is stabilized (post-forming behavior) our results suggest that oxygen exchange with the environment is suppressed and the OV dynamics that drives the memristive behavior is restricted to an internal electromigration between TiOx and TaOy layers. Our work provides relevant information for the design of reliable binary oxide memristive devices.
In this paper, we obtain experimental potentiation-depression (P-D) curves on different manganite-based memristive systems and simulate the learning process of perceptrons for character recognition. We analyze how the specific characteristics of the P-D curves affect the convergence time -characterized by the EPOCHs-to-convergence (ETC) parameter- of the network. Our work shows that ETC is reduced for systems displaying P-D curves with relatively low granularity and non-linear and asymmetric response. In addition, we also show that noise injection during the synaptic weight actualization further reduces the ETC. The results obtained here are expected to contribute to the optimization of hardware neural networks based on memristors cross-bar arrays.
Memristors are expected to be one of the key building blocks for the development of new bio-inspired nanoelectronics. Memristive effects in transition metal oxides are usually linked to the electromigration at the nanoscale of charged oxygen vacancies (OV). In this paper we address, for Pt/TiO x /TaO y /Pt devices, the exchange of OV between the device and the environment upon the application of electrical stress. From a combination of experiments and theoretical simulations we determine that both TiO x and TaO y layers oxidize, via environmental oxygen uptake, during the electroforming process. Once the memristive effect is stabilized (post-forming behavior) our results suggest that oxygen exchange with the environment is suppressed and the OV dynamics that drives the memristive behavior is restricted to an internal electromigration between TiO x and TaO y layers. Our work provides relevant information for the design of reliable binary oxide memristive devices.
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