No abstract

Material Renloval Rate efsapphire CMP us 血 g silica slurry with the血 11erenol increase as the higher concentration of the fUllereriol in the slurry ． The s皿 rface roughness of the sapphire substrate gives the 血fluence agaj 皿 st the MRR of sapphire CMP ． Raman spectra 血 dic飢 e tllat molecule stuctUre did net c 血ange du血 g CMP process． The struc 加 re of fine pa 丘icle by silica particle and 血 nerenol in 血 e liquid characterize using DLS method ． As resultS ， two layers 血llerenol molecules are adsorbed on the silica panicle， And we discuss on the fine particle wi 血 the fUlle 匸enol based on our results ・ Key Monts：LED ， Sapphire ， CMP ， fUllereno1 ， slurry -f e particle