The microampere-level domain wall currents in LiNbO3 single crystals have promising applications in nonvolatile
ferroelectric
domain wall random access memory and logic with high-density integration,
ultrafast operation speeds, and almost unlimited switching cycles.
For the memory commercialization, the improvements of the reliability
and operation speed of the devices are challenging due to the high-field
charge injection. The injected charge could compensate the domain-wall
boundary charge that screens the domain switching field and reduces
the domain wall current. In this work, two kinds of memory nanocells
were fabricated on the surfaces of X-cut LiNbO3 single
crystals to study the geometry-dependent charge injection. The striped
memory cell due to the appearance of the size-driven reconstruction
has a smaller coercive field than that of a clamped memory cell without
relaxation of the lattice matching stress, which reduces low-frequency
charge injection and increases the domain switching speed. At an operating
voltage of 5 V, we observed a retention time of more than 1 week and
an on/off current ratio of 2 × 104 for a striped-like
cell, paving the route to integrate energy-efficient high-density
domain wall memory in high reliability.
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