In order to improve corrosion resistance of pure titanium in strong acid solution, the tantalum modified layer was formed on the pure titanium surface by double glow plasma surface tantalumising. The modification layer was comprised of deposition layer and diffusion layer, which metallurgically adhered to the substrate. Tantalum element decreased with the case depth. The corrosion resistance of the tantalum modified layer in HCl solution was investigated by weight loss method and electrochemical measurements, and the corrosion morphology (SEM) was studied by SEM and X-ray diffraction. The annual corrosion rate of the modified layer was only 12 and 21% of pure titanium in 10 and 20 wt-% HCl solution respectively, and the corrosion rate was still small in 30% HCl solution. In concentrated acid for 120 h, it was found that there was significant pitting corrosion on the surface of pure titanium, while no pitting corrosion could be perceived in the modified layer. The main reason for the good corrosion resistance was a compact, stable tantalum oxidation film formed at the surface of the modified layer.

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