No abstract

To enhance thermoelectric performance by utilizing topological properties of topological insulators has attracted increasing attention. Here, we show that as grain size decreases from microns to ∼80 nm in thickness, the electron mobility μ increases steeply from 12–15 cm2 V−1 s−1 to ∼600 cm2 V−1 s−1, owing to the contribution of increased topologically protected conducting surfaces. Simultaneously, its lattice thermal conductivity is lowered by ∼30%–50% due to enhanced phonon scattering from the increased grain boundaries. As a result, thermoelectric figure of merit, ZT, of all the fine-grained samples is improved. Specifically, a maximum value of ZT = ∼0.63 is achieved for Bi2Se3 at T = ∼570 K.

The optical and structural properties of InGaN/GaN multi-quantum wells (MQWs) with different thicknesses of low temperature grown GaN cap layers are investigated. It is found that the MQW emission energy red-shifts and the peak intensity decreases with increasing GaN cap layer thickness, which may be partly caused by increased floating indium atoms accumulated at quantum well (QW) surface. They will result in the increased interface roughness, higher defect density, and even lead to a thermal degradation of QW layers. An extra growth interruption introduced before the growth of GaN cap layer can help with evaporating the floating indium atoms, and therefore is an effective method to improve the optical properties of high indium content InGaN/GaN MQWs.