Measurements of densities of excited atoms and metastables were performed in pure Ar and in mixtures of Ar and CF4 in inductively coupled plasma sustained by a high frequency (13.56 MHz) source and biased by a low frequency (500 kHz) voltage applied to the wafer supporting electrode. The measurements are made in front of the biased electrode with a goal to understand the effects of different parameters on the plasma profile and to test whether functional separation between plasma sustaining and biasing voltage is achieved. We find a very efficient separation with small or no observable effects of biasing voltage both in pure argon and in mixtures. These results have been achieved at all pressures (5–50 mTorr) and were confirmed by additional microwave measurements of electron density. The effect of flow rate, pressure, power, and distance from the biased electrode was studied from the spatial profiles of short lives excited states and metastable states of argon. We have also compared the profiles close to the biasing electrode, close to the coil and in extended processing chamber, and found a slight increase of metastable density close to the biasing electrode due to reduced electron quenching far from plasma source.