TiO2 thin films were prepared on glass substrates using the PLD (Pulsed Laser Deposition) technique. In order to carry out the ablation process, a Nd:YAG laser was used emitting in 1064 nm wavelength at 10 Hz repetition rate, set up for operating in both single-pulse and multi-pulse regimes. A comparison of the deposition rate, the optical and morphological properties of the layers obtained from both ablation regimes was made, which showed that the multi-pulsed ablation produced layers with a higher surface quality and better optical properties.

TiO 2 films were deposited onto glass substrates by pulsed laser deposition (PLD) in high vacuum under monopulse and multipulse excitation. After deposition, a thermal treatment on air atmosphere was done to promote crystallization. Films were studied by x-ray diffraction, energy dispersive spectroscopy, scanning electron, atomic force microscopy, UV-vis spectroscopy, and ellipsometry. After air annealing, films gain a different amount of oxygen: TiO 1.9 in multipulse regime versus TiO 1.7 in the monopulse one. Splashing is observed in both regimes although in the multipulse mode greater particles are found, that derived in a less compact film after annealing which could be the cause of the better oxygen diffusion. The optical band gap of the film prepared with monopulse excitation is 3.09 eV. This value increased to 3.34 eV with annealing, corresponding to that of anatase. The film made with multipulses has an E g =3.12 eV which was invariant upon annealing. The difference in the properties of the films grown in the different regimes was attributed to the re-excitation of the plasma during the ablation process in the multipulse ablation that leads to an increased splashing density and thereafter a less compact film and the presence of off-stoichiometry inclusions within the film bulk.