Coinfection rates with other pathogens in coronavirus disease 2019 (COVID-19) varied during the pandemic. We assessed the latest prevalence of coinfection with viruses, bacteria, and fungi in COVID-19 patients for more than one year and its impact on mortality. A total of 436 samples were collected between August 2020 and October 2021. Multiplex real-time PCR, culture, and antimicrobial susceptibility testing were performed to detect pathogens. The coinfection rate of respiratory viruses in COVID-19 patients was 1.4%. Meanwhile, the rates of bacteria and fungi were 52.6% and 10.5% in hospitalized COVID-19 patients, respectively. Respiratory syncytial virus, rhinovirus, Acinetobacter baumannii, Escherichia coli, Pseudomonas aeruginosa, and Candida albicans were the most commonly detected pathogens. Ninety percent of isolated A. baumannii was non-susceptible to carbapenem. Based on a multivariate analysis, coinfection (odds ratio [OR] = 6.095), older age (OR = 1.089), and elevated lactate dehydrogenase (OR = 1.006) were risk factors for mortality as a critical outcome. In particular, coinfection with bacteria (OR = 11.250), resistant pathogens (OR = 11.667), and infection with multiple pathogens (OR = 10.667) were significantly related to death. Screening and monitoring of coinfection in COVID-19 patients, especially for hospitalized patients during the pandemic, are beneficial for better management and survival.

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To achieve high accuracy and precision in optical metrology for advanced semiconductors, it is crucial to identify and compensate for errors from optical components and environmental perturbations. In this study, we investigated the sources of the errors in the interferometric ellipsometer developed for next-generation OCD. The objective lens and beam splitters, the critical optical components of the system, are intensively investigated. The system errors induced by temperature fluctuation, wavelength inaccuracy, and defocus were quantitatively examined. We also proposed methods for compensating individual errors and analyzed the effect of the compensation. As a result of error compensation, the accuracy and precision of the system is improved by 6.9 times and 2.3 times, respectively. Although the investigation was conducted based on our interferometric ellipsometry system, the finding is not limited to this system, as these errors are commonly found in most optical metrology systems. The proposed method for error compensation will be essential strategies for various ellipsometry systems suffering from a low level of accuracy and precision.