Vacuum circuit breakers (VCB) are commonly used in active mechanical direct current circuit breakers (DC CBs) to accomplish the interruption of the fault current. The post-arc current phenomenon of a VCB is related to the dielectric recovery process of the VCB. Thus, we performed experiments to investigate the influence on the post-arc current by taking the electrode separation, breaking current, and interruption of the bi-directional current with the injecting high frequency current in a fixed direction into account. To be in accordance with the practical interruption duty, the breaking current in the experiment ranges from 500 A to 20 kA. At the same time, the di/dt at current zero (CZ) varies between 200 and 1100 A/μs. The experiment results reveal that the peak value of the post-arc current in an active DC circuit breaker can reach more than 100 A with high di/dt at CZ. It is found that with a longer electrode separation, not only the residual charge increases but also the post-arc current increases. The arcing current before CZ can influence the post-arc current but the effective duration before CZ is short. This duration is the memory time and it is derived from the experiment results. The influence of the breaking current and interruption of the bi-directional current with the injecting current in a fixed direction are dependent on the relation of the current commutation time with the memory time.

The residual plasma in the inter-contact region of a vacuum circuit breaker moves towards the post-arc cathode at current zero, because the residual plasma mainly comes from the cathode spots during the arc burning process. In the most previous theoretical researches on the post-arc sheath expansion process of vacuum circuit breakers, only the thermal motion of residual plasma was taken into consideration. Alternately, the residual plasma was even assumed to be static at the moment of current zero in some simplified models. However, the influence of residual plasma drift velocity at current zero on the post-arc sheath expansion process was rarely investigated. In this paper, this effect is investigated by a one-dimensional particle-in-cell model. Simulation results indicate that the sheath expands slower with higher residual plasma drift velocity in the initial sheath expansion stage. However, with the increase of residual plasma drift velocity, the overall plasma density in the inter-contact region decreases faster, and the sheath expansion velocity increases earlier. Consequently, as a whole, it needs shorter time to expel the residual plasma from the inter-contact region. Furthermore, if the residual plasma drift velocity is high enough, the sheath expansion process ceases before it develops to the post-arc anode. Besides, the influence of the collisions between charges and neutrals is investigated as well in terms of the density of metal vapor. It shows that the residual plasma drift velocity takes remarkable effect only if the density of the metal vapor is relatively low, which corresponds to the circumstance of low-current interruptions.

The inter-contact region of vacuum circuit breakers is filled with residual plasma at the moment when the current is zero after the burning of metal vapor arc. The residual plasma forms an ion sheath in front of the post-arc cathode. The sheath then expands towards the post-arc anode under the influence of a transient recovery voltage. In this study, a one-dimensional particle-in-cell model is developed to investigate the post-arc sheath expansion. The influence of ion and electron temperatures on the decrease in local plasma density at the post-arc cathode side and post-arc anode side is discussed. When the decay in the local plasma density develops from the cathode and anode sides into the high-density region and merges, the overall plasma density in the inter-contact region begins to decrease. Meanwhile, the ion sheath begins to expand faster. Furthermore, the theory of ion rarefaction wave only explains quantitatively the decrease in the overall plasma density at relatively low ion temperatures. With the increase of ion temperature to certain extent, another possible reason for the decrease in the overall plasma density is proposed and results from the more active thermal diffusion of plasma. V C 2015 AIP Publishing LLC. [http://dx.

No abstract

No abstract