Refractive indices of films containing NBDA and QCA, and photoinduced refractive index changes of films containing norbornadiene moiety were measured, and the applicability of these materials to optical waveguide lithography was examined. Refractive indices of PMMA films containing QCA were smaller than those of PMMA films containing NBDA due to the difference of molar refractions between NBDA and QCA. Photoinduced refractive index change was measured for a P(NBDA/mXDA) film. The refractive index decreased as photochemistry proceeded keeping wide transparent wavelength region.