No abstract

We explore the thermoelectric and phonon transport properties of two-dimensional monochalcogenides (SnSe, SnS, GeSe, and GeS) using density functional theory combined with Boltzmann transport theory. We studied the electronic structures, Seebeck coefficients, electrical conductivities, lattice thermal conductivities, and figures of merit of these two-dimensional materials, which showed that the thermoelectric performance of monolayer of these compounds is improved in comparison compared to their bulk phases. High figures of merit (ZT) are predicted for SnSe (ZT = 2.63, 2.46), SnS (ZT = 1.75, 1.88), GeSe (ZT = 1.99, 1.73), and GeS (ZT = 1.85, 1.29) at 700 K along armchair and zigzag directions, respectively. Phonon dispersion calculations confirm the dynamical stability of these compounds. The calculated lattice thermal conductivities are low while the electrical conductivities and Seebeck coefficients are high. Thus, the properties of the monolayers show high potential toward thermoelectric applications.

Using density functional theory, we systematically investigate the lattice thermal conductivity and carrier mobility of monolayer SnX (X = S, Se). The room-temperature ultra low lattice thermal conductivities found in monolayer SnS (6.41 W m K) and SnSe (3.82 W m K) are attributed to the low phonon velocity, low Debye temperature, weak bonding interactions, and strong anharmonicity in monolayer SnX. The predicted values of lattice thermal conductivity are lower than those of other two-dimensional materials such as stanene, phosphorene, monolayer MoS, and bulk SnX. High phonon-limited carrier mobilities are obtained for the monolayer SnX. For example, the electron mobility of monolayer SnS is 756.60 cm V s and the hole mobility is 187.44 cm V s. The electron mobility of these monolayers is higher than their hole mobility due to the low effective mass of electrons and low deformation constants, which makes them n-type materials. Due to their ultra low lattice thermal conductivities coupled with high carrier mobilities, monolayer SnX materials may be promising materials for thermoelectric applications.

In this study, a NiO RRAM nanocapacitor array was fabricated on a graphene sheet, which was on a Nb-doped SrTiO(3) substrate containing terraces with a regular interval of about 100 nm and an atomically smooth surface. For the formation of the NiO RRAM nanocapacitor (Pt/NiO/graphene capacitor) array, an anodic aluminum oxide (AAO) nanotemplate with a pore diameter of about 30 nm and an interpore distance of about 100 nm was used. NiO and Pt were subsequently deposited on the graphene sheet. The NiO RRAM nanocapacitor had a diameter of about 30 +/- 2 nm and a thickness of about 33 +/- 3 nm. Typical unipolar switching characteristics of the NiO RRAM nanocapacitor array were confirmed. The NiO RRAM nanocapacitor array on graphene exhibited lower SET and RESET voltages than that on a bare surface of Nb-doped SrTiO(3).