Here, we demonstrate a process to produce planar semipolar (202¯1) GaN templates on sapphire substrates. We obtain (202¯1) oriented GaN by inclined c-plane sidewall growth from etched sapphire, resulting in single crystal material with on-axis x-ray diffraction linewidth below 200 arc sec. The surface, composed of (101¯1) and (101¯0) facets, is planarized by the chemical-mechanical polishing of full 2 in. wafers, with a final surface root mean square roughness of <0.5 nm. We then analyze facet formation and roughening mechanisms on the (202¯1) surface and establish a growth condition in N2 carrier gas to maintain a planar surface for further device layer growth. Finally, the capability of these semipolar (202¯1) GaN templates to produce high quality device structures is verified by the growth and characterization of InGaN/GaN multiple quantum well structures. It is expected that the methods shown here can enable the benefits of using semipolar orientations in a scalable and practical process and can be readily extended to achieve devices on surfaces using any orientation of semipolar GaN on sapphire.

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