We fabricated a 4-in large-area flexible infrared nanowire grid polarizer using a nanoimprint and metal thermal evaporation process. To protect the Si master template, as well as to prolong the service life of it, we first fabricated a nickel template as an alternative by an electroforming process. Then, the nanowire grid structure was transferred from this template to IPS substrate by a thermal nanoimprint process. Finally, Al was deposited on the IPS nanowire structure by vertical thermal evaporation technology. The results of the infrared optical test reveal that the TM transmittance of the polarizer is greater than 60% in the 4-5.71 μm and 5.73-6.7 μm wavelength ranges, and, especially, it is greater than 70% in the wavelength ranges of 4.70-5.69 μm and 5.75-6.59 μm. The extinction ratio is more than 20 dB in the wavelength range of 3.6-6.7 μm, proving that the polarizer has good polarization characteristics. The flexible infrared nanowire grid polarizer has potential applications in the fields of curved surface monitoring equipment and polarized imaging equipment.

We propose a novel flexible contact ultraviolet (UV)-curable nano-imprint lithography process which can directly transfer metallic nanostructures by UV curing bonding force. The flexible template evaporated with metal acts as a mask, allowing only the structural region to penetrate UV light and transfer surface metallic nanostructures. By this process, aluminum metal grating of different feature sizes had been transferred to abtain single-layer or even multi-layer metallic nanostructures. The minimum width and spacing of the wire grating were 50 nm and sub-20 nm, respectively. Aluminum grating polarizer had also been fabricated and tested demonstrating the practicability of the process. © 2019 The Japan Society of Applied Physics

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In order to achieve high-efficiency and high-precision fabrication of nanochannels in micro/nano-fluidic devices, a new method for integrating nano-imprint lithography manufacturing nano-channels and polydimethylsiloxane (PDMS) microchannels with silicon nitride as a bonding layer is proposed. Nanoimprint technology has the advantages of high-precision replication of the template nano-groove size and the ability to form a large number of channels at one time. By depositing silicon nitride on the surface of the nano-trench to improve its bonding force with PDMS treated with oxygen plasma, the bonding strength can withstand pressures above 0.3 MPa. The accuracy of making nanochannels with a characteristic size of 100 nm in this solution can reach more than 95%. Fluorescence experiments using this device show that the device has better enrichment capacity, and its mechanism can be explained by the size exclusion enrichment effect.