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High throughput laser mask repair system satisfying the accuracy demanded for 0.5 p m pattern rule reticles has been newly developed.The named Laser Mask Repair LM700A has the following features:. Opaque defect repair capability of 0.5 p m L&S patterns . High repair accuracy of45 nm (3 sigma) . Quartz damage depth of less than 2Onm. Transmission at the repair site of more than 96%. Pico-second solid state UV pulse laser and high resolution UV Optics Laser wavelength : 35 1 nm Laser pulse duration : less than 300 psObservation wavelength : 365 nm By utilizing a pico-second UV pulse laser, very high quality laser zapping can be obtained. This paper presents the configuration and the evaluated results for mask repair performance in conventional Cr binary masks.

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The saturation characteristics were studied on the freon gases (C4F8, FC-115 and FC-12) by a TEA CO2

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