The resistive switching characteristics of Pr0.7Ca0.3MnO3 (PCMO) thin films deposited on LaNiO3 (LNO)-electrodized Si substrate were investigated. Highly (100)-textured PCMO films were grown on the (100)-oriented LNO electrode. They exhibited reversible and steady bistable resistance switching behavior. The resistive switching behavior of PCMO capacitors on LNO is related to the trap-controlled space charge limited current mechanism and LNO/PCMO/LNO capacitor exhibits the strongest resistive switching effect with a resistance ratio for about two orders of magnitude.

Charge storage characteristics of metal-oxide-semiconductor (MOS) structure containing Au nanocrystals on tunnel oxide composed of triply stacked SiO2, HfO2, and Al2O3 layers were studied. Significantly high charge injection and detrapping efficiency for program and erase operations along with a satisfactory long-term charge retention were obtained from the above MOS structure. It is attributed to the bandgap engineering of tunnel oxide with a multistacked concave barrier, from which the effective thickness of the tunneling barrier can be greatly reduced under a moderate bias, while a thick and high barrier is retained for charge retention.

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Charge storage characteristics of metal-oxide-semiconductor (MOS) structures containing Au nanocrystals on tunnel oxide composed of Al2O3/HfO2/Al2O3 stacks in different thickness piling up sequences were investigated. A significant enhancement of charge injection efficiency for both electrons and holes without sacrificing charge retention performance was found in the sample with a relatively thicker (∼3 nm) Al2O3 sublayer adjacent to Au nanocrystals and a thinner (∼1 nm) Al2O3 sublayer in front of the Si substrate. It is attributed to the local enhancement of electric field induced by the embedded Au nanocrystals, which greatly modifies the effective barrier of tunnel oxide.

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