In the present study, potentiodynamic polarization scans followed by potentiostat anodizing tests have been employed to generate the anodic oxide films on commercially pure Ti in 1 M sulfuric acid and 1 M phosphoric acid. The highly stable single-barrier anodic films with a growth ratio of ∼1.5 nm V −1 (sulfuric acid) or ∼1.7 nm V −1 (phosphoric acid) were generated at the anodic voltages from 10 V to 60 V. During the potentiostatic anodizing, the anodic film was formed after the growth of the passive oxide film in the potentiodynamic polarization stage. Oxygen evolution proceeded within both the polarization and the anodizing stages, resulting in the suppression of the current efficiency for the growth of anodic films. The oxygen bubbles were induced by the amorphous-to-crystalline transition within the anodic film, leading to the formation of blister textures. Significant rupture of the anodic film was found that started at 20 V of the anodizing processes in the sulfuric acid; conversely, the significant rupture was started at 50 V in the phosphoric acid. The XRD results indicated that the degree of amorphous-to-crystalline transition in the anodic film formed in the phosphoric acid was less than the film formed in the sulfuric acid. The phosphate titanium oxide layers detected by XPS in the phosphoric acid indicated that more degrees of the amorphous-to-crystalline transition might be inhibited compared with the sulfated titanium oxides found in the sulfuric acid. Titanium can be anodized in acidic and basic solutions under potentiostatic or galvanostatic conditions. In view of the variation of titanium anodizing conditions, it is possible to tailor the anodic film thickness formed on the surface of titanium.1 The coloration of the oxide film produced through anodic oxidation is indicative of the thickness. This relation between color and thickness of the oxide is dependent on the anodizing condition and the nature of the electrolyte. Further, the thickness of the anodic oxide layer has been shown to be a linear function of the applied voltage.2-5 The anodic oxide film on titanium is basically amorphous in crystal structure and morphologically homogeneous.6 Moreover, such an oxide layer provides excellent resistance to corrosion as indicated electrochemically by a low level of electronic conductivity, 7 thermodynamically great stability 8 and low ion-formation tendency in aqueous environments. 9 The growth of the oxide thickness results in systemic changes of the surface topography, particularly in the surface pore configuration, 10 whereas electrolyte derived anion incorporation into oxide films will modify the chemical composition as well as the crystal structure. [11][12][13] It is generally known that titanium behaves as a typical valve metal for which oxide growth involves field-assisted migration of ions through the films and for the thickness to follow Faraday's law. [14][15][16] Further, the growth constant values of the anodic film are variable according to many academics. 17,18 It is reported that a...