Superconducting quantum circuits are one of the leading quantum computing platforms. To advance superconducting quantum computing to a point of practical importance, it is critical to identify and address material imperfections that lead to decoherence. Here, we use terahertz scanning near-field optical microscopy to probe the local dielectric properties and carrier concentrations of wet-etched aluminum resonators on silicon, one of the most characteristic components of the superconducting quantum processors. Using a recently developed vector calibration technique, we extract the THz permittivity from spectroscopy in proximity to the microwave feedline. Fitting the extracted permittivity to the Drude model, we find that silicon in the etched channel has a carrier concentration greater than buffer oxide etched silicon and we explore post-processing methods to reduce the carrier concentrations. Our results show that near-field THz investigations can be used to quantitatively evaluate and identify inhomogeneities in quantum devices.

Terahertz (THz) waves are a highly sensitive probe of free carrier concentrations in semiconducting materials. However, most experiments operate in the far-field, which precludes the observation of nanoscale features that affect the material response. Here, we demonstrate the use of nanoscale THz plasmon polaritons as an indicator of surface quality in prototypical quantum devices properties. Using THz near-field hyperspectral measurements, we observe polaritonic features in doped silicon near a metal-semiconductor interface. The presence of the THz surface plasmon polariton indicates the existence of a thin film doped layer on the device. Using a multilayer extraction procedure utilising vector calibration, we quantitatively probe the doped surface layer and determine its thickness and complex permittivity. The recovered multilayer characteristics match the dielectric conditions necessary to support the THz surface plasmon polariton. Applying these findings to superconducting resonators, we show that etching of this doped layer leads to an increase of the quality factor as determined by cryogenic measurements. This study demonstrates that THz scattering-type scanning near-field optical microscopy (s-SNOM) is a promising diagnostic tool for characterization of surface dielectric properties of quantum devices.

Superconducting circuits are among the most advanced quantum computing technologies; however, their performance is limited by losses found in surface oxides and disordered materials. In this work, we demonstrate the identification and spatial localization of a near-field signature of loss centers on tantalum films using terahertz scattering-type scanning near-field optical microscopy. By utilizing terahertz nanospectroscopy, we observe a localized excess vibrational mode around 0.5 THz and identify this resonance as the boson peak, a signature of amorphous materials. Grazing-incidence wide-angle X-ray scattering reveals that oxides on freshly solvent-cleaned samples are amorphous, whereas crystalline phases emerge after aging in air. Through nanoscale localization of defect centers, our findings provide valuable insights for the optimization of fabrication procedures for new low-loss superconducting circuits.