Phononic crystals (PnCs) are the acoustic wave equivalent of photonic crystals, where a periodic array of scattering inclusions located in a homogeneous host material causes certain frequencies to be completely reflected by the structure. In conjunction with creating a phononic band gap, anomalous dispersion accompanied by a large reduction in phonon group velocities can lead to a massive reduction in silicon thermal conductivity. We measured the cross plane thermal conductivity of a series of single crystalline silicon PnCs using time domain thermoreflectance. The measured values are over an order of magnitude lower than those obtained for bulk Si (from 148 W m(-1) K(-1) to as low as 6.8 W m(-1) K(-1)). The measured thermal conductivity is much smaller than that predicted by only accounting for boundary scattering at the interfaces of the PnC lattice, indicating that coherent phononic effects are causing an additional reduction to the cross plane thermal conductivity.

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We investigate thickness-limited size effects on the thermal conductivity of amorphous silicon thin films ranging from 3 -1636 nm grown via sputter deposition. While exhibiting a constant value up to ∼100 nm, the thermal conductivity increases with film thickness thereafter. This trend is in stark contrast with previous thermal conductivity measurements of amorphous systems, which have shown thickness-independent thermal conductivities. The thickness dependence we demonstrate is ascribed to boundary scattering of long wavelength vibrations and an interplay between the energy transfer associated with propagating modes (propagons) and nonpropagating modes (diffusons). A crossover from propagon to diffuson modes is deduced to occur at a frequency of ∼1.8 THz via simple analytical arguments. These results provide empirical evidence of size effects on the thermal conductivity of amorphous silicon and systematic experimental insight into the nature of vibrational thermal transport in amorphous solids.

Mass sensing based on mechanical oscillation frequency shift in micro/nano scale mechanical oscillators is a well-known and widely used technique. Piezo-electric, electronic excitation/detection and free-space optical detection are the most common techniques used for monitoring the minute frequency shifts induced by added mass. The advent of optomechanical oscillator (OMO), enabled by strong interaction between circulating optical power and mechanical deformation in high quality factor optical microresonators, has created new possibilities for excitation and interrogation of micro/nanomechanical resonators. In particular, radiation pressure driven optomechanical oscillators (OMOs) are excellent candidates for mass detection/measurement due to their simplicity, sensitivity and all-optical operation. In an OMO, a high quality factor optical mode simultaneously serves as an efficient actuator and a sensitive probe for precise monitoring of the mechanical eigen-frequencies of the cavity structure. Here, we show the narrow linewidth of optomechanical oscillation combined with harmonic optical modulation generated by nonlinear optical transfer function, can result in sub-pg mass sensitivity in large silica microtoroid OMOs. Moreover by carefully studying the impact of mechanical mode selection, device dimensions, mass position and noise mechanisms we explore the performance limits of OMO both as a mass detector and a high resolution mass measurement system. Our analysis shows that femtogram level resolution is within reach even with relatively large OMOs.