Atomic force microscopy (AFM) routinely achieves structural information in the sub-nm length scale. Measuring time resolved properties on this length scale to understand kinetics at the nm scale remains an elusive goal. We present a general analysis of the lower limit for time resolution in AFM. Our finding suggests the time resolution in AFM is ultimately limited by the well-known thermal limit of AFM and not as often proposed by the mechanical response time of the force sensing cantilever. We demonstrate a general pump-probe approach using the cantilever as a detector responding to the averaged signal. This method can be applied to any excitation signal such as electrical, thermal, magnetic or optical. Experimental implementation of this method allows us to measure a photocarrier decay time of ∼1 ps in low temperature grown GaAs using a cantilever with a resonance frequency of 280 kHz.

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We report a new experimental technique for Kelvin probe force microscopy (KPFM) using the dissipation signal of frequency modulation atomic force microscopy for bias voltage feedback. It features a simple implementation and faster scanning as it requires no low frequency modulation. The dissipation is caused by the oscillating electrostatic force that is coherent with the tip oscillation, which is induced by a sinusoidally oscillating voltage applied between the tip and sample. We analyzed the effect of the phase of the oscillating force on the frequency shift and dissipation and found that the relative phase of 90 • that causes only the dissipation is the most appropriate for KPFM measurements. The present technique requires a significantly smaller ac voltage amplitude by virtue of enhanced force detection due to the resonance enhancement and the use of fundamental flexural mode oscillation for electrostatic force detection. This feature will be of great importance in the electrical characterizations of technically relevant materials whose electrical properties are influenced by the externally applied electric field as is the case in semiconductor electronic devices.

Transition metal dichalcogenides (TMDCs) have attracted significant attention for optoelectronic, photovoltaic and photoelectrochemical applications. The properties of TMDCs are highly dependent on the number of stacked atomic layers, which is usually counted post-fabrication, using a combination of optical methods and atomic force microscopy height measurements. Here, we use photoluminescence spectroscopy, Raman spectroscopy, and three different AFM methods to demonstrate significant discrepancies in height measurements of exfoliated MoSe2 flakes on SiO2 depending on the method used. We also highlight the often overlooked effect that electrostatic forces can be misleading when measuring the height of a MoSe2 flake using AFM.

SummaryOptical beam deflection systems are widely used in cantilever based atomic force microscopy (AFM). Most commercial cantilevers have a reflective metal coating on the detector side to increase the reflectivity in order to achieve a high signal on the photodiode. Although the reflective coating is usually much thinner than the cantilever, it can still significantly contribute to the damping of the cantilever, leading to a lower mechanical quality factor (Q-factor). In dynamic mode operation in high vacuum, a cantilever with a high Q-factor is desired in order to achieve a lower minimal detectable force. The reflective coating can also increase the low-frequency force noise. In contact mode and force spectroscopy, a cantilever with minimal low-frequency force noise is desirable. We present a study on cantilevers with a partial reflective coating on the detector side. For this study, soft (≈0.01 N/m) and stiff (≈28 N/m) rectangular cantilevers were used with a custom partial coating at the tip end of the cantilever. The Q-factor, the detection and the force noise of fully coated, partially coated and uncoated cantilevers are compared and force distance curves are shown. Our results show an improvement in low-frequency force noise and increased Q-factor for the partially coated cantilevers compared to fully coated ones while maintaining the same reflectivity, therefore making it possible to combine the best of both worlds.